Lichtech Product: Acu-i  1000

 

High throughput full wafer/sample film thickness mapping solution

 

 

Acu-i 1000 is a full wafer imaging spectrometer system. It is capable of acquiring spectra of more than 10,000 measurement spots on a sample surface within 5 seconds. Innovative algorithms and software enable high-speed determination of thickness map across the entire wafer/sample.

 

 

Operation principles

 

  

Advantages

 

• Very high throughput, up to 300 wafers per hour (wph).
• Highly reliable, apart from wafer transportation system, the measurement system does not have any moving part.
• Wide measurement types, can measure both un-patterned and patterned wafers.
• Flexible, can operate either in stand-alone or integrated modes.

 

 

Specifications

 

• Measurement range: Any transparent films, 50 nm to 10 microns.
• Measurement precision (3-s):
• Thickness range 100nm – 10 microns: 0.5%.
• Thickness range 50 – 100 nm: 0.5 nm.
• Substrate size (diameter): 200 mm and 300 mm.
• Max film layers measurable: 4.
• Number of measurement spots: > 10,000.
• Per wafer measurement speed: < 5 sec / 10,000 points.
• Measurement throughput: 300 wph.

 

Applications

 

• Semiconductor lithography:
• Full wafer photo-resist thickness mapping.
• Critical dimension (CD) monitoring (contact Lichtech for more info).
• Etch CD monitoring (contact Lichtech for more info).
• CMP:
• Full wafer film thickness uniformity mapping and process control.
• Full wafer end-point detection.
• Film deposition on-line process control:
• Thermal and CVD.
• SOI.
• Epi.
• Flat-panel display inspection.

  

• Measurement examples